@article{oai:ous.repo.nii.ac.jp:00000823,
 author = {栗田, 満史 and Kurita, Mitsufumi and 竹中, 進 and Takenaka, Susumu and 中川, 紀美雄 and Nakagawa, Kimio and 赤尾, 文雄 and Akao, Fumio},
 journal = {岡山理科大学紀要. A, 自然科学, Bulletin of Okayama University of Science. A, Natural Sciences},
 month = {Mar},
 note = {P(論文), We have optically characterized a-SiC : H films prepared by plasma-CVD techniques under various deposition conditions. Infrared spectra were measured at room temperature, from which the banded H content (C_H) could be deduced. The optical band gap (E_o) and the slop of Urbach tail (E_e) by means of photoacoustic spectroscopy (PAS) at room temperature were obtained. The correlation between E_e and C_H was discussed from these data. As the result, we have found that the increase of the amount of H_2 gas affects the Urbach tail and serves the suppression of the disorder in the lattice.},
 pages = {137--148},
 title = {PASを用いた高周波プラズマCVD SiC:H薄膜の研究},
 volume = {24},
 year = {1989},
 yomi = {クリタ, ミツフミ and タケナカ, ススム and ナカガワ, キミオ and アカオ, フミオ}
}